Invention Application
US20170047235A1 Cover Plate, Plasma Treatment System Including the Same and Plasma Treatment Method of the Plasma Treatment System
审中-公开
包括等离子体处理系统的等离子体处理系统和等离子体处理方法
- Patent Title: Cover Plate, Plasma Treatment System Including the Same and Plasma Treatment Method of the Plasma Treatment System
- Patent Title (中): 包括等离子体处理系统的等离子体处理系统和等离子体处理方法
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Application No.: US15180877Application Date: 2016-06-13
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Publication No.: US20170047235A1Publication Date: 2017-02-16
- Inventor: Jongwoo Sun , Hakyoung Kim
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2015-0112533 20150810
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01J37/32 ; H01L21/3065
Abstract:
A cover plate, a plasma treatment system, and a plasma treatment method therewith are disclosed. The plasma treatment system may include a window, an antenna electrode disposed on the window, and a cover plate disposed between the antenna electrode and the window to cover top and side surfaces of the window.
Public/Granted literature
- US10431432B2 Plasma treatment system including cover plate to insulate window Public/Granted day:2019-10-01
Information query
IPC分类:
