- 专利标题: Direct Selective Adhesion Promotor Plating
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申请号: US14866050申请日: 2015-09-25
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公开(公告)号: US20170092569A1公开(公告)日: 2017-03-30
- 发明人: Jochen Dangelmaier , Kim Huat Hoa , Hazrul Alang Abd Hamid , Andreas Allmeier , Dietmar Lang
- 申请人: Infineon Technologies AG
- 主分类号: H01L23/495
- IPC分类号: H01L23/495 ; H01L21/56 ; H01L21/48
摘要:
A lead frame strip having a plurality of unit lead frames is provided. Each of the unit lead frames includes a die paddle, a plurality of leads extending away from the die paddle, and a peripheral ring delineating interior portions of the leads from exterior portions of the leads. An adhesion promoter plating material is selectively plated within a package outline area of a first unit lead frame. The die paddle and the interior portions of the leads are disposed within the package outline area and the exterior portions of the leads are disposed outside of the package outline area. Wire bond sides are processed such that, after selectively plating the adhesion promoter plating material, the wire bond sites are substantially devoid of the adhesion promoter plating material. The wire bond sites are disposed within the package outline area and are spaced apart from the peripheral ring.
公开/授权文献
- US09704786B2 Direct selective adhesion promotor plating 公开/授权日:2017-07-11
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