Invention Application
- Patent Title: SEMICONDUCTOR DEVICE COMPRISING A FIRST TRANSISTOR AND A SECOND TRANSISTOR
-
Application No.: US15351816Application Date: 2016-11-15
-
Publication No.: US20170141105A1Publication Date: 2017-05-18
- Inventor: Andreas MEISER , Dirk AHLERS , Till SCHLOESSER
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Priority: DE102015119771.5 20151116
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H03K17/687 ; H01L29/78

Abstract:
A semiconductor device includes a first transistor and a second transistor in a semiconductor substrate. The first transistor includes a first drain contact electrically connected to a first drain region, the first drain contact including a first drain contact portion and a second drain contact portion. The first drain contact portion includes a drain conductive material in direct contact with the first drain region. The second transistor includes a second source contact electrically connected to a second source region. The second source contact includes a first source contact portion and a second source contact portion. The first source contact portion includes a source conductive material in direct contact with the second source region.
Public/Granted literature
- US10700061B2 Semiconductor device comprising a first transistor and a second transistor Public/Granted day:2020-06-30
Information query
IPC分类: