- 专利标题: WAFER LAMINATE AND MAKING METHOD
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申请号: US15360418申请日: 2016-11-23
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公开(公告)号: US20170154802A1公开(公告)日: 2017-06-01
- 发明人: Hiroyuki Yasuda , Michihiro Sugo , Hideto Kato
- 申请人: SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址: JP Tokyo
- 专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人: SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址: JP Tokyo
- 优先权: JP2015-230407 20151126
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; C09D183/14 ; C09J183/14 ; H01L23/00 ; C09D165/00 ; H01L21/304 ; C09J5/00 ; C09D5/32 ; C09J165/00
摘要:
A wafer laminate has an adhesive layer (3) sandwiched between a transparent substrate (1) and a water (2), with a circuit-forming surface of the wafer facing the adhesive layer. The adhesive layer (3) includes a first cured resin layer (3a) disposed adjacent the substrate and having light-shielding properties and a second cured resin layer (3b) disposed adjacent the wafer and comprising a cured product of a thermosetting resin composition.
公开/授权文献
- US10453732B2 Wafer laminate and making method 公开/授权日:2019-10-22
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