An interconnect structure includes a lower interconnect layer, an intermediate interconnect layer, and an upper interconnect layer. First and second conductive lines in the lower interconnect layer extend generally in a first direction over a memory array region, and additional lower conductive lines in the lower interconnect layer extend generally in the first direction over a peripheral region. A first plurality of conductive line segments in the intermediate interconnect layer extend generally in the first direction over the memory array region, and additional intermediate conductive line segments in the intermediate interconnect layer extend generally in a second, perpendicular direction over the peripheral region. A second plurality of conductive line segments in the upper interconnect layer extend generally in the first direction over the memory array region, and additional upper conductive line segments in the upper interconnect layer extend generally in the first direction over the peripheral region.