- 专利标题： LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
-
申请号： US15589705申请日： 2017-05-08
-
公开(公告)号： US20170242348A1公开(公告)日： 2017-08-24
- 发明人: Michel RIEPEN , Christiaan Alexander HOOGENDAM , Paulus Martinus Maria LIEBREGTS , Ronald VAN DER HAM , Wilhelmus Franciscus Johannes SIMONS , Daniël Jozef Maria DIRECKS , Paul Petrus Joannes BERKVENS , Eva MONDT , Gert-Jan Gerardus Johannes Thomas BRANDS , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Mathieus Anna Karel VAN LIEROP , Christophe DE METSENAERE , Marcio Alexandre Cano MIRANDA , Patrick Johannes Wilhelmus SPRUYTENBURG , Joris Johan Anne-Marie VERSTRAETE , Franciscus Johannes Joseph JANSSEN
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
公开/授权文献
- US10268127B2 Lithographic apparatus and device manufacturing method 公开/授权日：2019-04-23
信息查询
IPC分类:
