公开(公告)号：US20170242348A1

公开(公告)日：2017-08-24

申请号：US15589705

申请日：2017-05-08

申请人： ASML NETHERLANDS B.V.

发明人： Michel RIEPEN ,  Christiaan Alexander HOOGENDAM ,  Paulus Martinus Maria LIEBREGTS ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Daniël Jozef Maria DIRECKS ,  Paul Petrus Joannes BERKVENS ,  Eva MONDT ,  Gert-Jan Gerardus Johannes Thomas BRANDS ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Mathieus Anna Karel VAN LIEROP ,  Christophe DE METSENAERE ,  Marcio Alexandre Cano MIRANDA ,  Patrick Johannes Wilhelmus SPRUYTENBURG ,  Joris Johan Anne-Marie VERSTRAETE ,  Franciscus Johannes Joseph JANSSEN

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.