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公开(公告)号：US20210181641A1
公开(公告)日：2021-06-17
申请号：US17186117
申请日：2021-02-26
发明人： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Artunç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC分类号： G03F7/20 , H01L21/027
摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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公开(公告)号：US20170219939A1
公开(公告)日：2017-08-03
申请号：US15328376
申请日：2015-06-26
发明人： Theodorus Wilhelmus POLET , Johannes Jacobus BASELMANS , Willem Jan BOUMAN , Han Henricus Aldegonda LEMPENS , Theodorus Marinus MODDERMAN , Cornelius Maria ROPS , Bart SMEETS , Koen STEFFENS , Ronald VAN DER HAM
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/7095
摘要： An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.
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公开(公告)号：US20200004162A1
公开(公告)日：2020-01-02
申请号：US16570382
申请日：2019-09-13
发明人： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Arturnç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC分类号： G03F7/20 , H01L21/027
摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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公开(公告)号：US20170242348A1
公开(公告)日：2017-08-24
申请号：US15589705
申请日：2017-05-08
发明人： Michel RIEPEN , Christiaan Alexander HOOGENDAM , Paulus Martinus Maria LIEBREGTS , Ronald VAN DER HAM , Wilhelmus Franciscus Johannes SIMONS , Daniël Jozef Maria DIRECKS , Paul Petrus Joannes BERKVENS , Eva MONDT , Gert-Jan Gerardus Johannes Thomas BRANDS , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Mathieus Anna Karel VAN LIEROP , Christophe DE METSENAERE , Marcio Alexandre Cano MIRANDA , Patrick Johannes Wilhelmus SPRUYTENBURG , Joris Johan Anne-Marie VERSTRAETE , Franciscus Johannes Joseph JANSSEN
IPC分类号： G03F7/20
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
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公开(公告)号：US20190004434A1
公开(公告)日：2019-01-03
申请号：US16063583
申请日：2016-12-08
发明人： Erik Henricus Egidius Catharina EUMMELEN , Giovanni Luca GATTOBIGIO , Johannes Cornelis Paulus MELMAN , Han Henricus Aldegonda LEMPENS , Miao YU , Cornelius Maria ROPS , Ruud OLIESLAGERS , Artunç ULUCAN , Theodorus Wilhelmus POLET , Patrick Johannes Wilhelmus SPRUYTENBURG
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70258 , G03F7/70716 , H01L21/0274
摘要： An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
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公开(公告)号：US20180267412A1
公开(公告)日：2018-09-20
申请号：US15918478
申请日：2018-03-12
发明人： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Wilhelmus Franciscus Johannes SIMONS , Martijn HOUBEN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Rogier Hendrikus Magdalena CORTIE , Ruud Hendrikus Martinus Johannes BLOKS , Gerben PIETERSE , Siegfried Alexander TROMP , Theodorus Wilhelmus POLET , Jim Vincent OVERKAMP , Van Vuong VY
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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公开(公告)号：US20210096471A1
公开(公告)日：2021-04-01
申请号：US16464361
申请日：2017-11-01
发明人： Erik Henricus Egidius Catharina EUMMELEN , Frank DEBOUGNOUX , Koen CUYPERS , Han Henricus Aldegonda LEMPENS , Theodoras Wilhelmus POLET , Jorge Alberto VIEYRA SALAS , John Maria BOMBEECK , Johannes Cornelis Paulus MELMAN , Giovanni Luca GATTOBIGIO
IPC分类号： G03F7/20
摘要： An immersion lithography apparatus controller configured to control a positioner to move a support table to follow an exposure route and to control a liquid confinement structure, the controller configured to: predict whether liquid will be lost from an immersion space during at least one motion of the route in which an edge of the object passes under an edge of the immersion space, and if liquid loss from the immersion space is predicted, modify the fluid flow such that a first fluid flow rate into or out of an opening at a leading edge of the liquid confinement structure is different to a second fluid flow rate into or out of an opening at a trailing edge of the liquid confinement structure during the motion of predicted liquid loss or a motion of the route subsequent to the motion of predicted liquid loss.
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公开(公告)号：US20170315454A1
公开(公告)日：2017-11-02
申请号：US15629399
申请日：2017-06-21
发明人： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Wilhelmus Franciscus Johannes SIMONS , Martijn HOUBEN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Han Henricus Aldegonda LEMPENS , Rogier Hendrikus Magdalena CORTIE , Ruud Hendrikus Martinus Johannes BLOKS , Gerben PIETERSE , Siegfried Alexander TROMP , Theodorus Wilhelmus POLET , Jim Vincent OVERKAMP , Van Vuong VY
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875 , G03F7/7095 , H01L21/682
摘要： An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
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