公开(公告)号：US20170363948A1

公开(公告)日：2017-12-21

申请号：US15537214

申请日：2015-12-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03B27/52 ,  G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20170242348A1

公开(公告)日：2017-08-24

申请号：US15589705

申请日：2017-05-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christiaan Alexander HOOGENDAM ,  Paulus Martinus Maria LIEBREGTS ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Daniël Jozef Maria DIRECKS ,  Paul Petrus Joannes BERKVENS ,  Eva MONDT ,  Gert-Jan Gerardus Johannes Thomas BRANDS ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Mathieus Anna Karel VAN LIEROP ,  Christophe DE METSENAERE ,  Marcio Alexandre Cano MIRANDA ,  Patrick Johannes Wilhelmus SPRUYTENBURG ,  Joris Johan Anne-Marie VERSTRAETE ,  Franciscus Johannes Joseph JANSSEN

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

公开(公告)号：US20160179015A1

公开(公告)日：2016-06-23

申请号：US15054010

申请日：2016-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Henrikus Herman Marie COX ,  Ronald VAN DER HAM ,  Wilhelmus Franciscus Johannes SIMONS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL ,  Gregory Martin Mason CORCORAN ,  Frank Johannes Jacobus VAN BOXTEL

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

公开(公告)号：US20240192607A1

公开(公告)日：2024-06-13

申请号：US17641206

申请日：2020-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus POLET ,  Koen STEFFENS ,  Ronald VAN DER HAM ,  Gerben PIETERSE ,  Erik Henricus Egidius Catharina EUMMELEN ,  Francis FAHRNI

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70733 ,  G03F7/70991

Abstract: A fluid handling system for wetting a substrate irradiated by radiation. The fluid handling system include a first device to confine a first liquid to a first space between the first device and the substrate. The first device includes a first liquid supply member to provide the first liquid to the first space and an extraction member to remove liquid. The fluid handling system further includes a second device including a second liquid supply member to provide a second liquid to a second space between the second device and the substrate, wherein there is a gap on the surface of the substrate between the first and second liquids. The fluid handling system is configured to provide the second liquid to the second space without removing any liquid from the second space to form a liquid layer, and is configured to provide the first and second liquids on the substrate simultaneously.

公开(公告)号：US20180210350A1

公开(公告)日：2018-07-26

申请号：US15320300

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerben PIETERSE ,  Theodorus Wilhelmus POLET ,  Johannes Jacobus Matheus BASELMANS ,  Willem Jan BOUMAN ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70316 ,  G03F7/70341

Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.

公开(公告)号：US20170219939A1

公开(公告)日：2017-08-03

申请号：US15328376

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus POLET ,  Johannes Jacobus BASELMANS ,  Willem Jan BOUMAN ,  Han Henricus Aldegonda LEMPENS ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

公开(公告)号：US20170108781A1

公开(公告)日：2017-04-20

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria ALBERTI ,  Hubert Marie SEGERS ,  Ronald VAN DER HAM ,  Francis FAHRNI ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria ROPS ,  Pepijn VAN DEN EIJNDEN ,  Paul VAN DONGEN ,  Bas WILLEMS

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/52 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67225

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US20240411233A1

公开(公告)日：2024-12-12

申请号：US18699358

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Sjoerd Nicolaas Lambertus DONDERS ,  Franciscus Johannes Joseph JANSSEN ,  Evgenia KURGANOVA ,  Abraham Jan WOLF ,  Ties Jan Willem BAKKER ,  Volker Dirk HILDENBRAND ,  Paul Alexander VERMEULEN ,  Michael ENGEL ,  Bernardus Antonius Johannes LUTTIKHUIS ,  Ronald VAN DER HAM ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00 ,  G03F1/62

Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.

公开(公告)号：US20210088912A1

公开(公告)日：2021-03-25

申请号：US17112278

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20200166851A1

公开(公告)日：2020-05-28

申请号：US16778635

申请日：2020-01-31

Applicant: ASML Netherlands B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.