Invention Application
- Patent Title: R-T-B BASED PERMANENT MAGNET
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Application No.: US15440443Application Date: 2017-02-23
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Publication No.: US20170250013A1Publication Date: 2017-08-31
- Inventor: Tamotsu ISHIYAMA , Masashi MIWA , Takashi WATANABE
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2016-035105 20160226
- Main IPC: H01F1/053
- IPC: H01F1/053 ; C22C38/14 ; C22C38/10 ; C21D3/06 ; C22C38/00 ; B22F9/04 ; B22F3/16 ; B22F5/00 ; C22C38/16 ; C22C38/06

Abstract:
An R-T-B based permanent magnet includes main phase grains composed of R2T14B type compound. R is a rare earth element. T is iron group element(s) essentially including Fe or Fe and Co. B is boron. An average grain size of the main phase grains is 0.8 μm to 2.8 μm. The R-T-B based permanent magnet contains at least C and Ga in addition to R, T, and B. B is contained at 0.71 mass % to 0.86 mass %. C is contained at 0.13 mass % to 0.34 mass %. Ga is contained at 0.40 mass % to 1.80 mass %. A formula (1) of 0.14≦[C]/([B]+[C])≦0.30 is satisfied, where [B] is a B content represented by atom %, and [C] is a C content represented by atom %.
Public/Granted literature
- US10784028B2 R-T-B based permanent magnet Public/Granted day:2020-09-22
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