Invention Application
- Patent Title: Metrology Target, Method and Apparatus, Target Design Method, Computer Program and Lithographic System
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Application No.: US15477602Application Date: 2017-04-03
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Publication No.: US20170293233A1Publication Date: 2017-10-12
- Inventor: Maurits VAN DER SCHAAR , Richard Johannes Franciscus VAN HAREN , Everhardus Cornelis MOS , Youping ZHANG
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027 ; H01L21/28

Abstract:
Disclosed is a method of measuring a target, associated substrate comprising a target and computer program. The target comprises overlapping first and second periodic structures. The method comprising illuminating the target with measurement radiation and detecting the resultant scattered radiation. The pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction at the second periodic structure resultant from said measurement radiation being initially incident on said second periodic structure. There may be propagative non-zeroth diffraction at the second periodic structure which comprises further diffraction of one or more non-zero diffraction orders resultant from diffraction by the first periodic structure. Alternatively, the detected scattered radiation may comprise non-zero diffraction orders obtained from diffraction at said the periodic structure which have been disturbed in the near field by the second periodic structure.
Public/Granted literature
- US10061212B2 Metrology target, method and apparatus, target design method, computer program and lithographic system Public/Granted day:2018-08-28
Information query
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