Invention Application
- Patent Title: METHOD FOR PRODUCING A SELF-ALIGNING MASKING LAYER
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Application No.: US15485232Application Date: 2017-04-12
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Publication No.: US20170294299A1Publication Date: 2017-10-12
- Inventor: Heiko Assmann , Felix Braun , Marcus Dankelmann , Stefan Doering , Karsten Friedrich , Udo Goetschkes , Andreas Greiner , Ralf Rudolf , Jens Schneider
- Applicant: Infineon Technologies AG
- Priority: DE102016106691.5 20160412
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L21/265 ; H01L21/266 ; H01L21/324 ; H01L21/02 ; H01L29/06 ; H01L21/268

Abstract:
In various embodiments, a method is provided. The method may include forming a buried electrically charged region at a predefined position in a first layer in such a way that the buried electrically charged region generates an electric field having a lateral inhomogeneous field distribution above the first layer, and forming a second layer above the first layer using the field distribution in such a way that a structure of the second layer correlates with the position of the buried electrically charged region.
Public/Granted literature
- US10468248B2 Method for producing a self-aligning masking layer Public/Granted day:2019-11-05
Information query
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