Invention Application
- Patent Title: SEMICONDUCTOR DEVICE
-
Application No.: US15664106Application Date: 2017-07-31
-
Publication No.: US20170352746A1Publication Date: 2017-12-07
- Inventor: Shunpei YAMAZAKI , Akihisa SHIMOMURA , Yasumasa YAMANE , Yuhei SATO , Tetsuhiro TANAKA , Masashi TSUBUKU , Toshihiko TAKEUCHI , Ryo TOKUMARU , Mitsuhiro ICHIJO , Satoshi TORIUMI , Takashi OHTSUKI , Toshiya ENDO
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2013-267525 20131225
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/02 ; H01L29/786

Abstract:
A change in electrical characteristics is suppressed and reliability in a semiconductor device using a transistor including an oxide semiconductor is improved. Oxygen is introduced into a surface of an insulating film, and then, an oxide semiconductor, a layer which is capable of blocking oxygen, a gate insulating film, and other films which composes a transistor are formed. For at least one of the first gate insulating film and the insulating film, three signals in Electron Spin Resonance Measurement are each observed in a certain range of g-factor. Reducing the sum of the spin densities of the signals will improve reliability of the semiconductor device.
Public/Granted literature
- US10050132B2 Method for manufacturing semiconductor device Public/Granted day:2018-08-14
Information query
IPC分类: