Invention Application
- Patent Title: ANISOTROPIC CONDUCTIVE FILM, MANUFACTURING METHOD THEREOF, AND CONNECTION STRUCTURE
-
Application No.: US15541621Application Date: 2016-01-05
-
Publication No.: US20170359904A1Publication Date: 2017-12-14
- Inventor: Kenichi HAGA , Tomoyuki ISHIMATSU , Yasushi AKUTSU
- Applicant: DEXERIALS CORPORATION
- Applicant Address: JP Shinagawa-ku, Tokyo
- Assignee: DEXERIALS CORPORATION
- Current Assignee: DEXERIALS CORPORATION
- Current Assignee Address: JP Shinagawa-ku, Tokyo
- Priority: JP2015-004592 20150113
- International Application: PCT/JP2016/050065 WO 20160105
- Main IPC: H05K3/32
- IPC: H05K3/32 ; H01B5/16 ; H01B1/22 ; H01L23/00 ; C09J9/02 ; H05K3/34

Abstract:
An anisotropic conductive film includes, as conductive particles for anisotropic conductive connection, metal particles such as solder particles having on the surface an oxide film. In this anisotropic conductive film, the metal particles are contained in an insulating film and regularly arranged as viewed in a plan view. A flux is disposed to be in contact with, or in proximity to, at least one of ends of the metal particles on a front surface side of the anisotropic conductive film and a rear surface side of the anisotropic conductive film. Preferable metal particles are solder particles. Preferably, the insulating film has a structure of two layers, and the metal particles are disposed between the two layers.
Public/Granted literature
- US10575410B2 Anisotropic conductive film, manufacturing method thereof, and connection structure Public/Granted day:2020-02-25
Information query