ANISOTROPIC CONDUCTIVE FILM, MANUFACTURING METHOD THEREOF, AND CONNECTION STRUCTURE

    公开(公告)号:US20170359904A1

    公开(公告)日:2017-12-14

    申请号:US15541621

    申请日:2016-01-05

    Abstract: An anisotropic conductive film includes, as conductive particles for anisotropic conductive connection, metal particles such as solder particles having on the surface an oxide film. In this anisotropic conductive film, the metal particles are contained in an insulating film and regularly arranged as viewed in a plan view. A flux is disposed to be in contact with, or in proximity to, at least one of ends of the metal particles on a front surface side of the anisotropic conductive film and a rear surface side of the anisotropic conductive film. Preferable metal particles are solder particles. Preferably, the insulating film has a structure of two layers, and the metal particles are disposed between the two layers.

    ANISOTROPIC CONDUCTIVE FILM AND PRODUCTION METHOD OF THE SAME

    公开(公告)号:US20170107406A1

    公开(公告)日:2017-04-20

    申请号:US15126898

    申请日:2015-01-29

    Abstract: An anisotropic conductive film contains conductive particles and spacers. The spacers are arranged at a central part of the film in a width direction. The central part of the film in the width direction represents 20 to 80% of the overall width of the film. The height of the spacers in the thickness direction of the anisotropic conductive film is larger than 5 μm and less than 75 μm. Such an anisotropic conductive film has a layered structure having a first insulating adhesion layer and a second insulating adhesion layer, wherein the conductive particles are dispersed in the first insulating adhesion layer, and the spacers are regularly arranged on a surface of the first insulating adhesion layer on a side of the second insulating adhesion layer.

    ANISOTROPIC CONDUCTIVE FILM, CONNECTED STRUCTURE, AND METHOD FOR MANUFACTURING A CONNECTED STRUCTURE

    公开(公告)号:US20190308403A1

    公开(公告)日:2019-10-10

    申请号:US16451441

    申请日:2019-06-25

    Abstract: The present invention is to provide an anisotropic conductive film that excels in dispersing conductive particles and trapping the particles, and maintains conduction reliability even between narrow-pitched terminals. By a method for manufacturing an anisotropic conductive film containing conductive particles, the conductive particles are buried in grooves in a sheet having the grooves regularly formed in the same direction, the conductive particles are arranged, a first resin film having a thermo-setting resin layer formed on a stretchable base film is laminated on the surface of the sheet on the side of the grooves to transfer and attach the conductive particles to the first resin film, the first resin film is uniaxially stretched in a direction other than the direction perpendicular to the array direction of the conductive particles, and a second resin film is laminated.

    BUMP-FORMING FILM, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF, AND CONNECTION STRUCTURE

    公开(公告)号:US20180218990A1

    公开(公告)日:2018-08-02

    申请号:US15542343

    申请日:2016-01-13

    Abstract: A bump-forming film is used for forming, on a semiconductor device such as a bumpless IC chip, bumps which are low in cost and can achieve stable conduction reliability. The bump-forming film is configured such that conductive fillers for bumps are arranged regularly in a planar view in an insulating adhesive resin layer. The regular arrangement has a periodic repeating unit in the longitudinal direction of the film. The straight line which connects one ends of the conductive fillers for bumps in the thickness direction of the film is substantially parallel to the surface of the film.

Patent Agency Ranking