Invention Application
- Patent Title: ELECTROSTATIC CHUCK WITH FEATURES FOR PREVENTING ELECTRICAL ARCING AND LIGHT-UP AND IMPROVING PROCESS UNIFORMITY
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Application No.: US15634365Application Date: 2017-06-27
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Publication No.: US20180012785A1Publication Date: 2018-01-11
- Inventor: Alexander Matyushkin , John Patrick Holland , Harmeet Singh , Alexi Marakhtanov , Keith Gaff , Zhigang Chen , Fleix Kozakevich
- Applicant: Lam Research Corporation
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/67
Abstract:
A substrate support for a substrate processing system includes a baseplate, a bond layer provided on the baseplate, and a ceramic layer arranged on the bond layer. The ceramic layer includes a first region and a second region located radially outward of the first region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness.
Public/Granted literature
Information query
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