Invention Application
- Patent Title: METHOD AND SYSTEM FOR WET CHEMICAL BATH PROCESS
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Application No.: US15272876Application Date: 2016-09-22
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Publication No.: US20180082834A1Publication Date: 2018-03-22
- Inventor: Yung-Ho CHEN
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67
Abstract:
A method for performing a wet chemical process over a semiconductor wafer is provided. The method includes moving the semiconductor wafer into a chemical solution. The method further includes leaving the semiconductor wafer in the chemical solution for a processing time period. The method also includes turning the semiconductor wafer upside down while the wafer is in the chemical solution. Moreover, the method includes removing the semiconductor wafer from the chemical solution.
Public/Granted literature
- US10043650B2 Method and system for wet chemical bath process Public/Granted day:2018-08-07
Information query
IPC分类:
