Invention Application
- Patent Title: SYSTEM, METHOD AND NON-TRANSITORY COMPUTER READABLE MEDIUM FOR TUNING SENSITIVIES OF, AND DETERMINNG A PROCESS WINDOW FOR, A MODULATED WAFER
-
Application No.: US15813004Application Date: 2017-11-14
-
Publication No.: US20180144996A1Publication Date: 2018-05-24
- Inventor: David Craig Oram , Abhinav Mathur , Kenong Wu , Eugene Shifrin
- Applicant: KLA-Tencor Corporation
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/67 ; G01N21/88 ; G01N21/95
Abstract:
A system, method, and non-transitory computer readable medium are provided for tuning sensitivities of, and determining a process window for, a modulated wafer. The sensitivities for dies of the modulated wafer are tuned dynamically based on a single set of parameters. Further, the process window is determined for the modulated wafer from prior determined parameter-specific nominal process windows.
Public/Granted literature
Information query
IPC分类:
