- 专利标题: LOW TEMPERATURE BAKING ADAPTED RESIST INK
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申请号: US15771663申请日: 2016-10-11
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公开(公告)号: US20180307139A1公开(公告)日: 2018-10-25
- 发明人: Tomoe Kobayashi , Toshio Watanabe
- 申请人: DIC Graphics Corporation
- 申请人地址: JP Tokyo
- 专利权人: DIC Graphics Corporation
- 当前专利权人: DIC Graphics Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP2015-210769 20151027
- 国际申请: PCT/JP2016/080079 WO 20161011
- 主分类号: G03F7/038
- IPC分类号: G03F7/038 ; C09D11/03 ; C09D11/104 ; C09D11/037 ; G03F7/039 ; C09D11/14
摘要:
The present invention has an object to provide a resist ink adaptable to low temperature baking that has both of an adhesiveness to the metal foil for constituting a circuit and an acidic etching resistance even at a low oven temperature. The present invention can overcome a negative effect of decreased baking temperature, that is, reduced adhesiveness of a printed coat to a substrate metal foil and reduced acidic etching resistance in the step of acidic etching. A resist ink is adaptable to low temperature baking containing a polyester resin, a titanium oxide, and an organic silicon compound as essential components.
公开/授权文献
- US10429733B2 Low temperature baking adapted resist ink 公开/授权日:2019-10-01
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