发明申请
- 专利标题： Combination Vacuum And Over-Pressure Process Chamber And Methods Related Thereto
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申请号： US15919169申请日： 2018-03-12
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公开(公告)号： US20180308732A1公开(公告)日： 2018-10-25
- 发明人: WILLIAM MOFFAT , CRAIG WALTER MCCOY
- 申请人： YIELD ENGINEERING SYSTEMS, INC.
- 主分类号： H01L21/673
- IPC分类号： H01L21/673 ; H01L21/67 ; H01L21/02 ; F27D5/00 ; F27D1/18
摘要：
A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.
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IPC分类:
