Invention Application
- Patent Title: MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS
-
Application No.: US15736297Application Date: 2016-04-28
-
Publication No.: US20180356738A1Publication Date: 2018-12-13
- Inventor: Antonius Franciscus Johannes DE GROOT , Theo Anjes Maria RUIJL , Christiaan Louis VALENTIN , Christan WERNER
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15176135.0 20150709
- International Application: PCT/EP2016/059508 WO 20160428
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/68 ; H01L21/027 ; G03B27/58

Abstract:
The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.
Public/Granted literature
- US10228626B2 Movable support and lithographic apparatus Public/Granted day:2019-03-12
Information query
IPC分类: