Invention Application
- Patent Title: GAS SUPPLY DEVICE CAPABLE OF MEASURING FLOW RATE, FLOWMETER, AND FLOW RATE MEASURING METHOD
-
Application No.: US16069126Application Date: 2017-01-12
-
Publication No.: US20190017855A1Publication Date: 2019-01-17
- Inventor: Yohei SAWADA , Nobukazu IKEDA , Kouji NISHINO , Masaaki NAGASE
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Priority: JP2016-006622 20160115
- International Application: PCT/JP2017/000762 WO 20170112
- Main IPC: G01F3/38
- IPC: G01F3/38 ; G01F15/04

Abstract:
A gas supply system includes a flow controller, a first shutoff valve provided downstream of the flow controller, a second shutoff valve provided in a first flow passage communicating with the downstream side of the first shutoff valve, a second flow passage branching from the first flow passage, a third shutoff valve provided in the second flow passage, a pressure sensor that detects a pressure in a flow passage surrounded by the first, second, and third shutoff valves, a temperature sensor that detects a temperature in the flow passage, a volume measuring tank having a known volume connected downstream of the third shutoff valve, and a controller that obtains a volume of the flow passage by applying Boyle's law to open and closed states of the third shutoff valve and calculates the flow rate using the passage volume and outputs of the pressure and temperature sensors.
Public/Granted literature
- US10895484B2 Gas supply device capable of measuring flow rate, flowmeter, and flow rate measuring method Public/Granted day:2021-01-19
Information query