- 专利标题: METHOD FOR ADJUSTING AND CONTROLLING BOUNDARY OF GRAPHENE
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申请号: US15990777申请日: 2018-05-28
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公开(公告)号: US20190094128A1公开(公告)日: 2019-03-28
- 发明人: HAOMIN WANG , LINGXIU CHEN , LI HE , HUISHAN WANG , HONG XIE , XIUJUN WANG , XIAOMING XIE
- 申请人: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADAMY OF SCIENCES
- 申请人地址: CN SHANGHAI
- 专利权人: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES
- 当前专利权人: SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY, CHINESE ACADEMY OF SCIENCES
- 当前专利权人地址: CN SHANGHAI
- 优先权: CN2017108906412 20170927
- 主分类号: G01N21/17
- IPC分类号: G01N21/17 ; B82Y40/00 ; C01B32/182
摘要:
A method for adjusting and controlling a boundary of graphene, comprising: providing an insulating substrate and placing the insulating substrate in a growth chamber; and feeding first reaction gas into the growth chamber, the first reaction gas at least comprising carbon source gas, and controlling a flow rate of the first reaction gas to forming a graphene structure having a first boundary shape on a surface of the insulating substrate through controlling a flow rate of the first reaction gas. The present invention realizes the controllability of the boundary of the graphene by adjusting the ratio of the carbon source gas to catalytic gas in the growth process of graphene on the surface of the substrate; the present invention can enable graphene to sequentially continuously grow by changing growth conditions on the basis of already formed graphene, so as to change the original boundary shape of the graphene.
公开/授权文献
- US10928304B2 Method for adjusting and controlling boundary of graphene 公开/授权日:2021-02-23
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