Invention Application
- Patent Title: METHOD AND APPARATUS FOR ESTIMATING DISPARITY
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Application No.: US15975808Application Date: 2018-05-10
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Publication No.: US20190156502A1Publication Date: 2019-05-23
- Inventor: Wonhee LEE , Kyungboo JUNG
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2017-0157352 20171123
- Main IPC: G06T7/593
- IPC: G06T7/593 ; H04N13/00

Abstract:
A disparity estimation method performed by a processor includes extracting a first image patch comprising a reference pixel from a first image, extracting a second image patch comprising a target pixel corresponding to the reference pixel from a second image, and estimating a residual of an initial disparity between the reference pixel and the target pixel from the first image patch and the second image patch using a residual model, the residual being an estimated difference between the initial disparity and an actual disparity between the reference pixel and the target pixel.
Public/Granted literature
- US10929998B2 Method and apparatus for estimating disparity Public/Granted day:2021-02-23
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