- 专利标题: METHOD OF OBTAINING AMOUNT OF DEVIATION OF A MEASURING DEVICE, AND METHOD OF CALIBRATING TRANSFER POSITION DATA IN A PROCESSING SYSTEM
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申请号: US16198924申请日: 2018-11-23
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公开(公告)号: US20190164791A1公开(公告)日: 2019-05-30
- 发明人: Kippei SUGITA , Daisuke KAWANO
- 申请人: TOKYO ELECTRON LIMITED
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2017-225510 20171124
- 主分类号: H01L21/67
- IPC分类号: H01L21/67 ; G01D5/241 ; H01J37/32 ; H01L21/683 ; H01L21/677 ; H01L21/68
摘要:
A measuring device includes sensor electrodes provided along a periphery of a base substrate such that a sum A of shortest distances from the sensor electrodes to an inner peripheral surface of a focus ring becomes a constant value, the sum A satisfying ∑ i = 1 N a C i = A ( N : the number of the sensor electrodes, Ci: measurement values and “a”: constant). A method of obtaining the amount of deviation of the central position of the measuring device in a region surrounded by the focus ring from the center of the region, includes: calculating the measurement values Ci using the measuring device; calculating the constant “a” using the measurement values Ci; calculating distances from the sensor electrodes to the inner peripheral surface of the focus ring using the constant “a” and the measurement values Ci; and calculating the amount of deviation of the central position of the measuring device based on the calculated distances.
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