METHOD OF OBTAINING AMOUNT OF DEVIATION OF A MEASURING DEVICE, AND METHOD OF CALIBRATING TRANSFER POSITION DATA IN A PROCESSING SYSTEM

    公开(公告)号:US20190164791A1

    公开(公告)日:2019-05-30

    申请号:US16198924

    申请日:2018-11-23

    摘要: A measuring device includes sensor electrodes provided along a periphery of a base substrate such that a sum A of shortest distances from the sensor electrodes to an inner peripheral surface of a focus ring becomes a constant value, the sum A satisfying ∑ i = 1 N  a C i = A ( N  : the number of the sensor electrodes, Ci: measurement values and “a”: constant). A method of obtaining the amount of deviation of the central position of the measuring device in a region surrounded by the focus ring from the center of the region, includes: calculating the measurement values Ci using the measuring device; calculating the constant “a” using the measurement values Ci; calculating distances from the sensor electrodes to the inner peripheral surface of the focus ring using the constant “a” and the measurement values Ci; and calculating the amount of deviation of the central position of the measuring device based on the calculated distances.

    CALIBRATION APPARATUS AND CALIBRATION METHOD

    公开(公告)号:US20220341844A1

    公开(公告)日:2022-10-27

    申请号:US17729000

    申请日:2022-04-26

    IPC分类号: G01N21/27 G01N21/25

    摘要: A calibration apparatus for calibrating an emission spectroscopy analyzer that monitors plasma generated in a plasma processing apparatus. The calibration apparatus comprises a base substrate; a plurality of light emitting devices disposed on the base substrate, each light emitting device of the plurality of light emitting devices is configured to emit light having different wavelengths from other light emitting devices of the plurality of light emitting devices; a reflector disposed on the base substrate, the reflector configured to reflect the light emitted by the plurality of light emitting devices toward an outside of the base substrate in a plan view; and a control device disposed on the base substrate, the control device configured to control the plurality of light emitting devices.

    MEASURING DEVICE AND OPERATION METHOD OF SYSTEM FOR INSPECTING FOCUS RING

    公开(公告)号:US20190279848A1

    公开(公告)日:2019-09-12

    申请号:US16296704

    申请日:2019-03-08

    IPC分类号: H01J37/32 G01R27/26 G01D5/241

    摘要: In a measuring device provided in a region surrounded by a focus ring and configured to measure an amount of consumption of the focus ring, the measuring device comprises: a disc-shaped base substrate; sensor electrodes provided on the base substrate; a high frequency oscillator configured to apply a high frequency signal to the sensor electrodes; and an operation unit configured to calculate measurement values indicating electrostatic capacitances of the sensor electrodes from detection values corresponding to potentials of the sensor electrodes. The operation unit calculates a representative value (average value) of the measurement values corresponding to the amount of consumption of the focus ring and derives the amount of consumption of the focus ring with reference to a table in which the amount of consumption of the focus ring is associated with the representative value (average value) of the measurement values corresponding to the amount of consumption.

    JIG, PROCESSING SYSTEM AND PROCESSING METHOD

    公开(公告)号:US20210166960A1

    公开(公告)日:2021-06-03

    申请号:US17105753

    申请日:2020-11-27

    摘要: A jig includes a base, light sources disposed on the base, the sources configured to emit light of different wavelengths, a controller disposed on the base, the controller being configured to cause the light sources to be turned on or off based on a given program, and a power source disposed on the base, the power source being configured to supply power to the light sources and the controller. The jig has a shape enabling a transfer device to transfer the jig, the transfer device being provided in a vacuum transfer module and configured to transfer a substrate.

    POSITION DETECTING SYSTEM AND PROCESSING APPARATUS

    公开(公告)号:US20180301322A1

    公开(公告)日:2018-10-18

    申请号:US15949205

    申请日:2018-04-10

    IPC分类号: H01J37/32 H01L21/67 G01B11/27

    摘要: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges.

    POSITION DETECTION SYSTEM AND PROCESSING APPARATUS

    公开(公告)号:US20180090354A1

    公开(公告)日:2018-03-29

    申请号:US15718066

    申请日:2017-09-28

    IPC分类号: H01L21/67 G01S17/06

    摘要: There is provided a position detection system for use in a processing apparatus including a mounting table configured to mount thereon a disc-shaped target object and a focus ring surrounding a periphery of the mounting table. The system includes a light source configured to generate measurement light, three or more optical elements configured to emit the measurement light as emission light and receive reflected light, a driving unit configured to move each of the optical elements such that a scanning range from the focus ring to the target object is scanned, and a control unit configured to obtain positional relation between the focus ring and the target object based on the reflected light in the scanning range of each of the optical elements.

    MEASURING DEVICE AND METHOD FOR OBTAINING AMOUNT OF DEVIATION OF MEASURING DEVICE

    公开(公告)号:US20190277665A1

    公开(公告)日:2019-09-12

    申请号:US16294385

    申请日:2019-03-06

    IPC分类号: G01D5/24 H01L21/67

    摘要: A measuring device includes a disc-shaped base substrate, sensor electrodes arranged circumferentially along a periphery of the base substrate, a high frequency oscillator configured to apply a high frequency signal to the sensor electrodes, C/V conversion circuits, each being configured to convert a voltage amplitude at a corresponding sensor electrode among the sensor electrodes to a voltage signal indicating an electrostatic capacitance, an A/D converter configured to convert the voltage signal outputted from each of the C/V conversion circuits to a digital value, and a switching mechanism configured to switch each sensor electrode of the sensor electrodes between a first state in which the sensor electrodes are electrically connected to the C/V conversion circuits and a second state in which electrode pairs are connected to different C/V conversion circuits among the C/V conversion circuits. Each electrode pair includes circumferentially adjacent two sensor electrodes among the sensor electrodes.

    METHOD FOR ACQUIRING DATA INDICATING ELECTROSTATIC CAPACITANCE

    公开(公告)号:US20170278735A1

    公开(公告)日:2017-09-28

    申请号:US15465056

    申请日:2017-03-21

    摘要: In a method for acquiring data indicating an electrostatic capacitance between a focus ring and a measuring device includes a disc-shaped base substrate, sensor units arranged along an edge of the base substrate and a circuit substrate mounted on the base substrate, a processor acquires one or more first data sets respectively including a plurality of digital values indicating an electrostatic capacitance of a corresponding sensor unit. The measuring device is transferred to a region on the mounting table surrounded by the focus ring. The processor acquires second data sets when one or more digital values or an average of the digital values included in each of said one or more first data sets exceeds a first threshold. The processor stores measurement data including the respective second data sets or averages of the digital values of each of the second data sets. The measuring device is unloaded from the chamber.