- 专利标题: EDGE TERMINATION DESIGNS FOR SEMICONDUCTOR POWER DEVICES
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申请号: US15076553申请日: 2016-03-21
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公开(公告)号: US20190206986A1公开(公告)日: 2019-07-04
- 发明人: Jun Hu , Zhiyun Luo , Fei Wang
- 申请人: Jun Hu , Zhiyun Luo , Fei Wang
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L21/266 ; H01L21/761
摘要:
This invention discloses a semiconductor power device formed on a semiconductor substrate comprises an active cell area and a termination area disposed near edges of the semiconductor substrate. The termination area comprises a plurality of duplicated units wherein each unit includes at least two trenches filled with a conductive trench material having a mesa area between adjacent trenches wherein the trenches and the mesa areas within each of the duplicated units are electrically shunt together. In the termination area each of the trenches in the duplicated units has a buried guard ring dopant region disposed below a bottom surface of the trenches.
公开/授权文献
- US11101346B2 Edge termination designs for semiconductor power devices 公开/授权日:2021-08-24
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