- 专利标题: PELLICLE AND RETICLE INCLUDING THE SAME
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申请号: US16125864申请日: 2018-09-10
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公开(公告)号: US20190243234A1公开(公告)日: 2019-08-08
- 发明人: Yongseung MOON , Heebom Kim , Changyoung Jeong
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 优先权: KR10-2018-0014337 20180206
- 主分类号: G03F1/62
- IPC分类号: G03F1/62 ; G03F1/22
摘要:
Provided is a pellicle to be used in a photolithography process. The pellicle a film, at least a portion of which includes carbon allotropes. The film has a first surface and a second surface facing the first surface, the film comprises a doped region including dopants, the doped region adjacent to the first surface, the dopants include least one of boron or nitrogen, and the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.
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