公开(公告)号：US20190243234A1

公开(公告)日：2019-08-08

申请号：US16125864

申请日：2018-09-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yongseung MOON ,  Heebom Kim ,  Changyoung Jeong

IPC: G03F1/62 ,  G03F1/22

CPC classification number: G03F1/62 ,  G03F1/22

Abstract: Provided is a pellicle to be used in a photolithography process. The pellicle a film, at least a portion of which includes carbon allotropes. The film has a first surface and a second surface facing the first surface, the film comprises a doped region including dopants, the doped region adjacent to the first surface, the dopants include least one of boron or nitrogen, and the doped region comprises a bond between an atom of at least one of the dopants and a carbon atom.