Invention Application
- Patent Title: INTERCONNECT STRUCTURE AND ELECTRONIC DEVICE EMPLOYING THE SAME
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Application No.: US16238208Application Date: 2019-01-02
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Publication No.: US20200035602A1Publication Date: 2020-01-30
- Inventor: Seunggeol Nam , Hyeonjin Shin , Keunwook Shin , Changhyun Kim , Kyung-Eun Byun , Hyunjae Song , Eunkyu Lee , Changseok Lee , Alum Jung , Yeonchoo Cho
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2018-0087273 20180726
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L23/528 ; H01L23/522

Abstract:
An interconnect structure and an electronic device including the interconnect structure are disclosed. The interconnect structure may include a metal interconnect having a bottom surface and two opposite side surfaces surrounded by a dielectric layer, a graphene layer on the metal interconnect, and a metal bonding layer providing interface adhesion between the metal interconnect and the graphene layer. The metal bonding layer includes a metal material.
Public/Granted literature
- US11069619B2 Interconnect structure and electronic device employing the same Public/Granted day:2021-07-20
Information query
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