Invention Application
- Patent Title: SENSOR MARK AND A METHOD OF MANUFACTURING A SENSOR MARK
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Application No.: US16488259Application Date: 2018-02-15
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Publication No.: US20200064183A1Publication Date: 2020-02-27
- Inventor: Joost André KLUGKIST , Vadim Yevgenyevich BANINE , Johan Franciscus Maria BECKERS , Madhusudhanan JAMBUNATHAN , Maxim Aleksandrovich NASALEVICH , Andrey NIKIPELOV , Roland Johannes Wilhelmus STAS , David Ferdinand VLES , Wilhelmus Jacobus Johannes WELTERS , Sandro WRICKE
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP17161058.7 20170315; EP17176554.8 20170619; EP17183234.8 20170726
- International Application: PCT/EP2018/053761 WO 20180215
- Main IPC: G01J1/42
- IPC: G01J1/42

Abstract:
A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.
Public/Granted literature
- US10976196B2 Sensor mark and a method of manufacturing a sensor mark Public/Granted day:2021-04-13
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