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公开(公告)号：US20220276553A1
公开(公告)日：2022-09-01
申请号：US17637891
申请日：2020-08-20
发明人： Andrey NIKIPELOV , Sander BALTUSSEN , Vadim Yevgenyevich BANINE , Alexandr DOLGOV , DONMEZ NOYAN , Zomer Silvester HOUWELING , Arnoud Willem NOTENBOOM , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Paul Alexander VERMEULEN , David Ferdinand VLES , Victoria VORONINA , Halil Gökay YEGEN
IPC分类号： G03F1/62 , C01B32/158 , G03F7/20
摘要： A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
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2.发明申请公开(公告)号：US20180220518A1
公开(公告)日：2018-08-02
申请号：US15747499
申请日：2016-08-03
发明人： Alexey Olegovich POLYAKOV , Richard QUINTANILHA , Vadim Yevgenyevich BANINE , Coen Adrianus VERSCHUREN
CPC分类号： H05G2/00 , G03F1/84 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/7085 , G21K1/06 , H01L22/12
摘要： A target structure (T) made by lithography or used in lithography is inspected by irradiating the structure at least a first time with EUV radiation (304) generated by inverse Compton scattering. Radiation (308) scattered by the target structure in reflection or transmission is detected (312) and properties of the target structure are calculated by a processor (340) based on the detected scattered radiation. The radiation may have a first wavelength in the EUV range of 0.1 nm to 125 nm. Using the same source and controlling an electron energy, the structure may be irradiated multiple times with different wavelengths within the EUV range, and/or with shorter (x-ray) wavelengths and/or with longer (UV, visible) wavelengths. By rapid switching of electron energy in the inverse Compton scattering source, irradiation at different wavelengths can be performed several times per second.
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公开(公告)号：US20160301180A1
公开(公告)日：2016-10-13
申请号：US15035674
申请日：2014-11-27
发明人： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Johannes Antonius Gerardus AKKERMANS , Erik LOOPSTRA , Wouter Joep ENGELEN , Petrus Rutgerus BARTRAIJ , Teis Johan COENEN , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
CPC分类号： H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
摘要： An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
摘要翻译： 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作，其中电子束包括仅由第一注射器提供的电子束和第二模式，其中电子束包括仅由第二注射器提供的电子束。
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公开(公告)号：US20190302625A1
公开(公告)日：2019-10-03
申请号：US16435630
申请日：2019-06-10
发明人： Wouter Joep ENGELEN , Otger Jan LUITEN , Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Erik Roelof LOOPSTRA
IPC分类号： G03F7/20 , H05H7/04 , G02B1/06 , G01J1/04 , G01J1/42 , G01J1/26 , H01S3/09 , G02B5/20 , G02B26/02 , G21K1/10
摘要： A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US20170160646A1
公开(公告)日：2017-06-08
申请号：US15432698
申请日：2017-02-14
发明人： Vadim Yevgenyevich BANINE , Erik Roelof Loopstra , Johannes Hubertus Josephina Moors , Jan Bernard Plechelmus Van Schoot , Gerardus Hubertus Petrus Maria Swinkels , Andrei Mikhailovich Yakunin , Antonius Johannes Josephus Van Dijsseldonk , Wilhelmus Petrus De Boeij
CPC分类号： G03F7/70191 , B82Y10/00 , G02B1/11 , G02B5/1838 , G02B5/281 , G02B5/283 , G03F7/70008 , G03F7/702 , G03F7/70308 , G03F7/70575 , G21K1/062 , G21K1/067 , G21K2201/061 , G21K2201/067 , H05G2/003 , H05G2/005 , H05G2/008
摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.
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公开(公告)号：US20160225477A1
公开(公告)日：2016-08-04
申请号：US14917623
申请日：2014-09-24
发明人： Vadim Yevgenyevich BANINE , Peturs Rutgerus BARTRAIJ , Ramon Pascal VAN GORKOM , Lucas Johannes Peter AMENT , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Rilpho Ludovicus DONKER , Wouter Joep ENGELEN , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Erik Roelof LOOPSTRA , Han-Kwang NIENHUYS , Andrey Alexandrovich NIKIPELOV , Michael Jozef Mathijs RENKENS , Franciscus Johannes Joseph JANSSEN , Borgert KRUIZINGA
摘要： A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
摘要翻译： 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。
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公开(公告)号：US20160147161A1
公开(公告)日：2016-05-26
申请号：US14900110
申请日：2014-06-17
发明人： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
IPC分类号： G03F7/20
CPC分类号： G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
摘要： A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
摘要翻译： 图案化平版印刷基板的方法，其包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备。 该方法还包括通过使用基于反馈的控制回路来相对地调节自由电子激光器的调节和调整自由电子激光器的操作来减少递送到光刻基片的EUV辐射的功率波动，以及将可变衰减应用于具有 由自由电子激光器输出，以便进一步控制传送到光刻设备的EUV辐射的功率。
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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
发明人： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC分类号： G03F7/20
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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公开(公告)号：US20180081278A1
公开(公告)日：2018-03-22
申请号：US15789702
申请日：2017-10-20
发明人： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
CPC分类号： G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
摘要： A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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10.发明申请公开(公告)号：US20170205704A1
公开(公告)日：2017-07-20
申请号：US15320749
申请日：2015-07-02
发明人： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Arjen BOOGAARD , Florian Didier Albin DHALLUIN , Alexey Sergeevich KUZNETSOV , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Andrei Mikhailovich YAKUNIN
CPC分类号： G03F1/62 , G02B5/1838 , G02B5/208 , G03F1/24 , G03F1/38 , G03F7/70191 , G03F7/70316 , G03F7/70575 , G03F7/70891 , G03F7/70916 , G03F7/70958 , G03F7/70983
摘要： A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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