公开(公告)号：US20210132517A1

公开(公告)日：2021-05-06

申请号：US16472712

申请日：2017-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Joost André KLUGKIST ,  Maxim Aleksandrovich NASALEVICH ,  Roland Johannes Wilhelmus STAS ,  WRICKE Sandro

IPC: G03F9/00

Abstract: A lithographic apparatus has an object, the object includes: a substrate and optionally a lower layer on the substrate; an upper layer; and an intermediate layer between the upper layer and the substrate, wherein a bond strength between the intermediate layer and the substrate or lower layer is greater than a bond strength between the intermediate layer and the upper layer and the intermediate layer has a Young's Modulus and/or a Poisson ratio within 20% of that of the upper layer.

公开(公告)号：US20200064183A1

公开(公告)日：2020-02-27

申请号：US16488259

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost André KLUGKIST ,  Vadim Yevgenyevich BANINE ,  Johan Franciscus Maria BECKERS ,  Madhusudhanan JAMBUNATHAN ,  Maxim Aleksandrovich NASALEVICH ,  Andrey NIKIPELOV ,  Roland Johannes Wilhelmus STAS ,  David Ferdinand VLES ,  Wilhelmus Jacobus Johannes WELTERS ,  Sandro WRICKE

IPC: G01J1/42

Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.

公开(公告)号：US20240176255A1

公开(公告)日：2024-05-30

申请号：US18284608

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Remco VAN DE MEERENDONK ,  Daniel Jozef, Maria DIRECKS ,  Günes NAKÍBOGLU ,  Nicholas Peter WATERSON ,  Joost André KLUGKIST ,  Sven PEKELDER ,  Antonius Johannus VAN DER NET ,  Johannes Henricus Wilhelmus JACOBS ,  Jaap OUDES ,  Gerardus Arnoldus Hendricus, Franciscus JANSSEN ,  Jeroen, Peterus Johannes VAN LIPZIG ,  Johannes, Franciscus Martinus VAN SANTVOORT

IPC: G03F7/00

CPC classification number: G03F7/70891

Abstract: A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：US20180299792A1

公开(公告)日：2018-10-18

申请号：US15569384

申请日：2016-05-04

Applicant: ASML Netherlands B.V.

Inventor： Jelte Rients BEARDA ,  Joost André KLUGKIST ,  Robbert Jan VOOGD ,  Guido HERGENHAN ,  Meik PANITZ ,  Jochen TAUBERT

IPC: G03F7/20 ,  G02B5/20 ,  F21V9/32 ,  H04N5/225

Abstract: A method of forming a radiation filter for a lithographic system, the method including forming at least one structure in or on a filter body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d): a) the at least one structure includes a plurality of transmissive, reflective, absorbing or fluorescent structures, and the method includes providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure includes forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure includes altering at least one optical property to provide a variation of the optical property with position; d) the at least one structure includes a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence.