Invention Application
- Patent Title: ANNULAR MEMBER, PLASMA PROCESSING APPARATUS AND PLASMA ETCHING METHOD
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Application No.: US16545185Application Date: 2019-08-20
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Publication No.: US20200066496A1Publication Date: 2020-02-27
- Inventor: Shingo KITAMURA , Koichi KAZAMA , Masahiro OGASAWARA , Susumu NOGAMI , Tetsuji SATO
- Applicant: Tokyo Electron Limited
- Priority: JP2018-155796 20180822
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/687 ; H01L21/3213
Abstract:
An annular member is disposed to surround a pedestal for receiving a substrate in a plasma processing apparatus. The annular member contains quartz and silicon. A content percentage of the silicon in the quartz and the silicon is 2.5% or more and 10% and less by weight.
Public/Granted literature
- US11257662B2 Annular member, plasma processing apparatus and plasma etching method Public/Granted day:2022-02-22
Information query
