Invention Application
- Patent Title: HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
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Application No.: US16690712Application Date: 2019-11-21
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Publication No.: US20200168486A1Publication Date: 2020-05-28
- Inventor: Tatsuya Yamaguchi , Yasuaki Kikuchi , Koji Yoshii , Wataru Nakajima , Norio Baba
- Applicant: Tokyo Electron Limited
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5e9c651f
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/66 ; H01L21/263
Abstract:
A heat treatment apparatus includes a heating unit provided around a processing container accommodating a substrate; a plurality of blowing units configured to blow a cooling medium into a space between the processing container and the heating unit; and a shutter configured to simultaneously opens/closes at least two of the plurality of blowing units and including a slit formed corresponding to each of the blowing units.
Public/Granted literature
- US11114319B2 Heat treatment apparatus and heat treatment method Public/Granted day:2021-09-07
Information query
IPC分类:
