Invention Application
- Patent Title: POLYMERIZABLE MONOMERS AND METHOD OF POLYMERIZING THE SAME
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Application No.: US17027590Application Date: 2020-09-21
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Publication No.: US20210002396A1Publication Date: 2021-01-07
- Inventor: Robert LISKA , Christian GORSCHE , Markus KURY , Yan CHEN , Chunhua LI , Srinivas KAZA
- Applicant: Align Technology, Inc.
- Applicant Address: US CA San Jose
- Assignee: Align Technology, Inc.
- Current Assignee: Align Technology, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: C08F120/30
- IPC: C08F120/30 ; G03F7/00
Abstract:
Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
Public/Granted literature
- US12152092B2 Polymerizable monomers and method of polymerizing the same Public/Granted day:2024-11-26
Information query
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