公开(公告)号：US20200040113A1

公开(公告)日：2020-02-06

申请号：US16653028

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  Markus KURY ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: C08F120/30 ,  G03F7/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US20230210635A1

公开(公告)日：2023-07-06

申请号：US17883390

申请日：2022-08-08

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  Gyorgy HARAKALY ,  Markus KURY ,  Jurgen STAMPFL ,  Peter DORFINGER ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: A61C7/08 ,  C08G18/44 ,  C08G18/32 ,  C08G18/81 ,  B22F10/12 ,  C08J5/00 ,  C08G18/10 ,  A61C7/10 ,  C08G18/73 ,  C08G18/34 ,  C08G18/75 ,  B22F10/20 ,  B22F10/60 ,  B22F10/38

CPC classification number: A61C7/08 ,  C08G18/44 ,  C08G18/3212 ,  C08G18/815 ,  B22F10/12 ,  C08J5/00 ,  C08G18/10 ,  A61C7/10 ,  C08G18/73 ,  C08G18/348 ,  C08G18/3206 ,  C08G18/755 ,  B22F10/20 ,  B22F10/60 ,  B22F10/38 ,  C08J2375/04

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US20250043047A1

公开(公告)日：2025-02-06

申请号：US18918364

申请日：2024-10-17

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  Markus KURY ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: C08F120/30 ,  A61C7/08 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C08F2/48 ,  G03F7/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US20210002396A1

公开(公告)日：2021-01-07

申请号：US17027590

申请日：2020-09-21

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  Markus KURY ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: C08F120/30 ,  G03F7/00

Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.

公开(公告)号：US20200040130A1

公开(公告)日：2020-02-06

申请号：US16653018

申请日：2019-10-15

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  György HARAKALY ,  Markus KURY ,  Jürgen STAMPFL ,  Peter DORFINGER ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: C08G18/81 ,  C08G18/32 ,  C08G18/73 ,  C08G18/75 ,  A61C7/10 ,  C08G18/44 ,  C08G18/34 ,  C08J5/00 ,  A61C7/08 ,  C08G18/10

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US20190338067A1

公开(公告)日：2019-11-07

申请号：US16403429

申请日：2019-05-03

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  György HARAKALY ,  Markus KURY ,  Jürgen STAMPFL ,  Peter DORFINGER ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: C08G18/81 ,  C08G18/75 ,  C08G18/73 ,  C08G18/32 ,  C08G18/44 ,  C08G18/34 ,  C08G18/10 ,  C08J5/00 ,  A61C7/08 ,  A61C7/10

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.

公开(公告)号：US20240325117A1

公开(公告)日：2024-10-03

申请号：US18735815

申请日：2024-06-06

Applicant: Align Technology, Inc.

Inventor： Robert LISKA ,  Christian GORSCHE ,  Gyorgy HARAKALY ,  Markus KURY ,  Jurgen STAMPFL ,  Peter DORFINGER ,  Yan CHEN ,  Chunhua LI ,  Srinivas KAZA

IPC: A61C7/08 ,  A61C7/10 ,  B22F10/12 ,  B22F10/20 ,  B22F10/38 ,  B22F10/60 ,  C08G18/10 ,  C08G18/32 ,  C08G18/34 ,  C08G18/44 ,  C08G18/73 ,  C08G18/75 ,  C08G18/81 ,  C08J5/00

CPC classification number: A61C7/08 ,  A61C7/10 ,  B22F10/12 ,  C08G18/10 ,  C08G18/3206 ,  C08G18/3212 ,  C08G18/348 ,  C08G18/44 ,  C08G18/73 ,  C08G18/755 ,  C08G18/815 ,  C08J5/00 ,  B22F10/20 ,  B22F10/38 ,  B22F10/60 ,  C08J2375/04

Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.