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1.发明公开公开(公告)号：US20240059927A1
公开(公告)日：2024-02-22
申请号：US18450258
申请日：2023-08-15
Applicant: Align Technology, Inc.
Inventor： Bettina KOCH , Timon THEUER , Alexander HOCHWALLNER , Robert LISKA , Jürgen STAMPFL , Yan CHEN , Chunhua LI , Peter DORFINGER
IPC: C09D129/10 , C09D11/102 , C09D11/107 , A61C7/00 , A61C7/08 , B33Y70/00 , B33Y80/00
CPC classification number: C09D129/10 , C09D11/102 , C09D11/107 , A61C7/002 , A61C7/08 , B33Y70/00 , B33Y80/00 , A61C2201/00 , B29C64/124
Abstract: The present disclosure provides a range of printed materials comprising discrete layers or segment with distinct compositions, and which can collectively lend to high levels of strength, toughness, and break resistance, and these printed materials may contain thin, ductile layers interspersed between thicker, harder layers, thus in printing such materials, the present disclosure further provides a range of compositions and methods, including low viscosity, air stable, and rapidly solutions amenable to thin layer inkjet printing.
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公开(公告)号：US20230210635A1
公开(公告)日：2023-07-06
申请号：US17883390
申请日：2022-08-08
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , Gyorgy HARAKALY , Markus KURY , Jurgen STAMPFL , Peter DORFINGER , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: A61C7/08 , C08G18/44 , C08G18/32 , C08G18/81 , B22F10/12 , C08J5/00 , C08G18/10 , A61C7/10 , C08G18/73 , C08G18/34 , C08G18/75 , B22F10/20 , B22F10/60 , B22F10/38
CPC classification number: A61C7/08 , C08G18/44 , C08G18/3212 , C08G18/815 , B22F10/12 , C08J5/00 , C08G18/10 , A61C7/10 , C08G18/73 , C08G18/348 , C08G18/3206 , C08G18/755 , B22F10/20 , B22F10/60 , B22F10/38 , C08J2375/04
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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公开(公告)号：US20200040113A1
公开(公告)日：2020-02-06
申请号：US16653028
申请日：2019-10-15
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , Markus KURY , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: C08F120/30 , G03F7/00
Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
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Patent Agency Ranking
公开(公告)号：US20200040130A1
公开(公告)日：2020-02-06
申请号：US16653018
申请日：2019-10-15
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , György HARAKALY , Markus KURY , Jürgen STAMPFL , Peter DORFINGER , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: C08G18/81 , C08G18/32 , C08G18/73 , C08G18/75 , A61C7/10 , C08G18/44 , C08G18/34 , C08J5/00 , A61C7/08 , C08G18/10
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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公开(公告)号：US20190338067A1
公开(公告)日：2019-11-07
申请号：US16403429
申请日：2019-05-03
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , György HARAKALY , Markus KURY , Jürgen STAMPFL , Peter DORFINGER , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: C08G18/81 , C08G18/75 , C08G18/73 , C08G18/32 , C08G18/44 , C08G18/34 , C08G18/10 , C08J5/00 , A61C7/08 , A61C7/10
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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公开(公告)号：US20250043047A1
公开(公告)日：2025-02-06
申请号：US18918364
申请日：2024-10-17
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , Markus KURY , Yan CHEN , Chunhua LI , Srinivas KAZA
Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
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公开(公告)号：US20210002396A1
公开(公告)日：2021-01-07
申请号：US17027590
申请日：2020-09-21
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , Markus KURY , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: C08F120/30 , G03F7/00
Abstract: Provided herein are photopolymerizable monomers, optionally for use as reactive diluents in a high temperature lithography-based photopolymerization process, a method of producing polymers using said photopolymerizable monomers, the polymers thus produced, and orthodontic appliances comprising the polymers.
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公开(公告)号：US20240325117A1
公开(公告)日：2024-10-03
申请号：US18735815
申请日：2024-06-06
Applicant: Align Technology, Inc.
Inventor： Robert LISKA , Christian GORSCHE , Gyorgy HARAKALY , Markus KURY , Jurgen STAMPFL , Peter DORFINGER , Yan CHEN , Chunhua LI , Srinivas KAZA
IPC: A61C7/08 , A61C7/10 , B22F10/12 , B22F10/20 , B22F10/38 , B22F10/60 , C08G18/10 , C08G18/32 , C08G18/34 , C08G18/44 , C08G18/73 , C08G18/75 , C08G18/81 , C08J5/00
CPC classification number: A61C7/08 , A61C7/10 , B22F10/12 , C08G18/10 , C08G18/3206 , C08G18/3212 , C08G18/348 , C08G18/44 , C08G18/73 , C08G18/755 , C08G18/815 , C08J5/00 , B22F10/20 , B22F10/38 , B22F10/60 , C08J2375/04
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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