Invention Application
- Patent Title: Shutter Disk
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Application No.: US17010961Application Date: 2020-09-03
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Publication No.: US20210074552A1Publication Date: 2021-03-11
- Inventor: Zhang Kang , Junqi Wei , Yueh Sheng Ow , Kelvin Boh , Yuichi Wada , Ananthkrishna Jupudi , Sarath Babu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01L21/322 ; H01L21/02 ; H01L23/00 ; H01L21/50 ; H01L21/768 ; H01L21/67
Abstract:
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
Public/Granted literature
- US11171017B2 Shutter disk Public/Granted day:2021-11-09
Information query
IPC分类:
