- 专利标题： INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES
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申请号： US17129686申请日： 2020-12-21
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公开(公告)号： US20210109046A1公开(公告)日： 2021-04-15
- 发明人: Brett Lewis , Wilhelm Kuehn , Deying Xia , Shawn McVey , Ulrich Mantz
- 申请人： Carl Zeiss SMT GmbH , Carl Zeiss Microscopy, LLC
- 申请人地址： DE Oberkochen; US NY Thornwood
- 专利权人： Carl Zeiss SMT GmbH,Carl Zeiss Microscopy, LLC
- 当前专利权人： Carl Zeiss SMT GmbH,Carl Zeiss Microscopy, LLC
- 当前专利权人地址： DE Oberkochen; US NY Thornwood
- 优先权： DE102018212403.5 20180725
- 主分类号： G01N23/2258
- IPC分类号： G01N23/2258 ; H01J49/14 ; H01J37/26 ; H01L21/67
摘要：
An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.
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