公开(公告)号：US20210109046A1

公开(公告)日：2021-04-15

申请号：US17129686

申请日：2020-12-21

申请人： Carl Zeiss SMT GmbH ,  Carl Zeiss Microscopy, LLC

发明人： Brett Lewis ,  Wilhelm Kuehn ,  Deying Xia ,  Shawn McVey ,  Ulrich Mantz

IPC分类号： G01N23/2258 ,  H01J49/14 ,  H01J37/26 ,  H01L21/67

摘要： An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.

公开(公告)号：US11378532B2

公开(公告)日：2022-07-05

申请号：US17129686

申请日：2020-12-21

申请人： Carl Zeiss SMT GmbH ,  Carl Zeiss Microscopy, LLC

发明人： Brett Lewis ,  Wilhelm Kuehn ,  Deying Xia ,  Shawn McVey ,  Ulrich Mantz

IPC分类号： G01N23/2258 ,  H01J37/26 ,  H01J49/14 ,  H01L21/67

摘要： An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.