- 专利标题： Residual gain monitoring and reduction for EUV drive laser
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申请号： US17228157申请日： 2021-04-12
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公开(公告)号： US20210235572A1公开(公告)日： 2021-07-29
- 发明人: Chun-Lin Louis Chang , Jen-Hao Yeh , Han-Lung Chang , Tzung-Chi Fu , Bo-Tsun Liu , Li-Jui Chen , Po-Chung Cheng
- 申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： H05G2/00
- IPC分类号： H05G2/00 ; G21K1/06 ; H01S3/13 ; H01S3/104
摘要：
A system includes a laser source operable to provide a laser beam, a laser amplifier having a gain medium operable to provide energy to the laser beam when the laser beam passes through the laser amplifier, and a residual gain monitor operable to provide a probe beam and operable to derive a residual gain of the laser amplifier from the probe beam when the probe beam passes through the laser amplifier while being offset from the laser beam in time or in path.
公开/授权文献
- US11737200B2 Residual gain monitoring and reduction for EUV drive laser 公开/授权日：2023-08-22
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