公开(公告)号：US11973302B2

公开(公告)日：2024-04-30

申请号：US18171609

申请日：2023-02-20

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Chun-Lin Louis Chang ,  Henry Tong Yee Shian ,  Alan Tu ,  Han-Lung Chang ,  Tzung-Chi Fu ,  Bo-Tsun Liu ,  Li-Jui Chen ,  Po-Chung Cheng

IPC分类号： H01S3/104 ,  H01S3/04 ,  H01S3/041 ,  H01S3/10 ,  H01S3/1123 ,  H01S3/223 ,  H01S3/23 ,  H05G2/00 ,  H01S3/00

CPC分类号： H01S3/104 ,  H01S3/1001 ,  H01S3/2316 ,  H05G2/008 ,  H01S3/005 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/10038 ,  H01S3/10069 ,  H01S3/1123 ,  H01S3/2232

摘要： The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

公开(公告)号：US10524345B2

公开(公告)日：2019-12-31

申请号：US15946316

申请日：2018-04-05

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Chun-Lin Louis Chang ,  Jen-Hao Yeh ,  Han-Lung Chang ,  Tzung-Chi Fu ,  Bo-Tsun Liu ,  Li-Jui Chen ,  Po-Chung Cheng

IPC分类号： H05G2/00 ,  H01S3/104 ,  H01S3/11 ,  G21K1/06 ,  H01S3/23 ,  H01S3/223

摘要： A laser system includes a laser source operable to provide a laser beam; a laser amplifier having an input port and an output port and operable to amplify the laser beam, the laser beam travelling along a main beam path through the laser amplifier from the input port to the output port; and a residual gain monitor operable to provide a probe laser beam, the probe laser beam travelling along a probe beam path through the laser amplifier from the output port to the input port, wherein the residual gain monitor calculates a residual gain of the laser amplifier according to the probe laser beam.

公开(公告)号：US20190148905A1

公开(公告)日：2019-05-16

申请号：US16232637

申请日：2018-12-26

申请人： GIGAPHOTON INC.

发明人： Hiroshi UMEDA ,  Osamu WAKABAYASHI

IPC分类号： H01S3/097 ,  H01S3/0975 ,  H01S3/104

摘要： A discharge excitation gas laser device includes: first and second discharge electrodes disposed to face each other; a plurality of peaking capacitors connected to the first discharge electrode; a charger; a plurality of pulse power modules, each one of the pulse power modules including a charging capacitor to which a charged voltage is applied from the charger, a pulse compression circuit that pulse-compresses and outputs electrical energy stored in the charging capacitor as an output pulse to a corresponding peaking capacitor, and a switch disposed between the charging capacitor and the pulse compression circuit; a plurality of output pulse sensors, each one of the output pulse sensors detecting an output pulse output by a corresponding pulse power module; and a control unit configured to control, based on a detection result of each of the output pulse sensor, a tinting of a switch signal to be input to a corresponding switch.

公开(公告)号：US20190141826A1

公开(公告)日：2019-05-09

申请号：US16221699

申请日：2018-12-17

申请人： Gigaphoton Inc.

发明人： Tsukasa HORI ,  Kouji KAKIZAKI ,  Tatsuya YANAGIDA ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC分类号： H05G2/00 ,  H01S3/16 ,  H01S3/104 ,  H01S3/23 ,  H01S3/00 ,  H01S3/09 ,  H01S3/11 ,  H01S3/223

摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

公开(公告)号：US20190081450A1

公开(公告)日：2019-03-14

申请号：US16178363

申请日：2018-11-01

申请人： Gigaphoton Inc.

发明人： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC分类号： H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20190081449A1

公开(公告)日：2019-03-14

申请号：US16178351

申请日：2018-11-01

申请人： Gigaphoton Inc.

发明人： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC分类号： H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

摘要： A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20180301862A1

公开(公告)日：2018-10-18

申请号：US15943901

申请日：2018-04-03

申请人： FANUC CORPORATION

发明人： Kazuya OOTA

IPC分类号： H01S3/036 ,  H01S3/104 ,  H01S3/097 ,  H01S3/22 ,  H01S3/038

摘要： A laser machining device capable of recovering an exhaust performance of a dry pump easily is provided. A laser machining device includes: an oscillating portion that generates a machining laser beam G; an enclosure portion in which a first gas is enclosed; and an exhausting portion that exhausts the first gas together with a dirt generated in the enclosure portion in association with an operation of the oscillating portion. The exhausting portion includes: a dry pump; a first line that connects the enclosure portion and the dry pump; a second line that supplies a second gas having a higher pressure than the first gas to the dry pump; a valve portion that opens or closes the first line and the second line; and a control unit that controls opening or closing of the valve portion.

公开(公告)号：US20180123308A1

公开(公告)日：2018-05-03

申请号：US15858219

申请日：2017-12-29

申请人： GIGAPHOTON INC.

发明人： Minoru TANIYAMA ,  Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC分类号： H01S3/038 ,  H01S3/086 ,  H01S3/104 ,  H01S3/134 ,  H01S3/0971

CPC分类号： H01S3/038 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/0385 ,  H01S3/0804 ,  H01S3/08059 ,  H01S3/086 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/134 ,  H01S3/136 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2308 ,  H01S2301/20

摘要： A laser unit may include a laser chamber including a pair of discharge electrodes that are opposed to each other in a first direction with an electrode gap interposed in between and are configured to provide a discharge width in a second direction, orthogonal to the first direction, smaller than the electrode gap; and an optical resonator including a first optical member and a second optical member that are opposed to each other in a third direction orthogonal to both the first direction and the second direction with the discharge electrodes interposed in between, and configured to amplify laser light generated between the discharge electrodes and output amplified laser light, the optical resonator satisfying the following expression to configure a stable resonator in the second direction: 0

公开(公告)号：US20180097331A1

公开(公告)日：2018-04-05

申请号：US15817270

申请日：2017-11-19

申请人： Matheson Tri-Gas, Inc.

发明人： Joseph Vininski ,  Dane Scott

IPC分类号： H01S3/036 ,  H01S3/225 ,  H01S3/22 ,  H01S3/104

CPC分类号： H01S3/036 ,  H01S3/104 ,  H01S3/2207 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2255

摘要： The present invention relates to a system for recirculating the gas atmosphere within an excimer laser system, where contaminates, created in the laser's operation, are removed, and the gas concentrations of additive gases, such as Xe, Kr, or others, depleted in the laser operation, are rebalanced to specific lasing mixtures by analyzation and component replenishment from one or more external supplies.

公开(公告)号：US09882339B2

公开(公告)日：2018-01-30

申请号：US15422684

申请日：2017-02-02

申请人： FANUC CORPORATION

发明人： Tetsuhisa Takazane

IPC分类号： H01S3/22 ,  H01S3/041 ,  H01S3/102 ,  H01S3/104 ,  H01S3/131 ,  H01S3/134 ,  H01S3/0943 ,  H01S3/097

CPC分类号： H01S3/041 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0943 ,  H01S3/097 ,  H01S3/1026 ,  H01S3/104 ,  H01S3/1317 ,  H01S3/134 ,  H01S3/22

摘要： A laser oscillation device can prevent a laser medium-circulating pipe from expanding. The laser oscillation device includes a resonator part, which has an introduction port, through which a laser medium is introduced, and a discharge port, from which the laser medium is discharged, and which generates a laser beam, a laser medium-circulating pipe having one end connected to the introduction port, and the other end connected to the discharge port, a blower arranged in the laser medium-circulating pipe, to circulate the laser medium so that the laser medium is introduced from the introduction port to the resonator part, and the laser medium introduced to the resonator part is discharged from the discharge port, and a heat-insulating mechanism which is provided in the laser medium-circulating pipe, to block heat conduction between the laser medium flowing through the laser medium-circulating pipe and the laser medium-circulating pipe.