发明申请
- 专利标题： Shutter Disk
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申请号： US17498129申请日： 2021-10-11
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公开(公告)号： US20220028702A1公开(公告)日： 2022-01-27
- 发明人: Zhang Kang , Junqi Wei , Yueh Sheng Ow , Kelvin Boh , Yuichi Wada , Ananthkrishna Jupudi , Sarath Babu
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/48
- IPC分类号： H01L21/48 ; H01L21/67 ; H01L23/00 ; H01L21/768 ; H01L21/322 ; H01L21/50 ; H01L21/02 ; H01L21/60
摘要：
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
公开/授权文献
- US11862480B2 Shutter disk 公开/授权日：2024-01-02
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