- 专利标题: SYSTEM AND METHOD USING X-RAYS FOR DEPTH-RESOLVING METROLOGY AND ANALYSIS
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申请号: US17476355申请日: 2021-09-15
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公开(公告)号: US20220082515A1公开(公告)日: 2022-03-17
- 发明人: Wenbing Yun , Benjamin Donald Stripe , Janos Kirz , Sylvia Jia Yun Lewis
- 申请人: Sigray, Inc.
- 申请人地址: US CA Concord
- 专利权人: Sigray, Inc.
- 当前专利权人: Sigray, Inc.
- 当前专利权人地址: US CA Concord
- 主分类号: G01N23/223
- IPC分类号: G01N23/223 ; G01N23/083 ; G01N23/2273
摘要:
A system and method for analyzing a three-dimensional structure of a sample includes generating a first x-ray beam having a first energy bandwidth less than 20 eV at full-width-at-half maximum and a first mean x-ray energy that is in a range of 1 eV to 1 keV higher than an absorption edge energy of a first atomic element of interest, and that is collimated to have a collimation angular range less than 7 mrad in at least one direction perpendicular to a propagation direction of the first x-ray beam; irradiating the sample with the first x-ray beam at a plurality of incidence angles relative to a substantially flat surface of the sample, the incidence angles of the plurality of incidence angles in a range of 3 mrad to 400 mrad; and simultaneously detecting a reflected portion of the first x-ray beam from the sample and detecting x-ray fluorescence x-rays and/or photoelectrons from the sample.
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