Invention Application
- Patent Title: PARTICLE BEAM SYSTEM FOR AZIMUTHAL DEFLECTION OF INDIVIDUAL PARTICLE BEAMS AND METHOD FOR AZIMUTH CORRECTION IN A PARTICLE BEAM SYSTEM
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Application No.: US17546952Application Date: 2021-12-09
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Publication No.: US20220102104A1Publication Date: 2022-03-31
- Inventor: Hans Fritz , András G. Major , Dirk Zeidler , Arne Thoma , Joerg Jacobi
- Applicant: Carl Zeiss MultiSEM GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss MultiSEM GmbH
- Current Assignee: Carl Zeiss MultiSEM GmbH
- Current Assignee Address: DE Oberkochen
- Priority: DE102019004124.0 20190613
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/09 ; H01J37/28

Abstract:
A particle beam system includes a multi-beam particle source for generating a multiplicity of charged individual particle beams, and a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array includes a magnetically conductive multi-aperture plate having a multiplicity of openings, which is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the openings of the multi-aperture plate. The magnetic multi-deflector array also includes a magnetically conductive aperture plate having an individual opening. The aperture plate is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the first aperture plate. The multi-aperture plate and the first aperture plate are connected to each other such that a cavity is formed between the two plates. A first coil for generating a magnetic field is arranged in the cavity between the first aperture plate and the multi-aperture plate such that the multiplicity of individual particle beams substantially pass through the coil.
Information query