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    Multi-beam charged particle system
    2.
    发明授权
    Multi-beam charged particle system 有权

    公开(公告)号：US11087948B2

    公开(公告)日：2021-08-10

    申请号：US16940863

    申请日：2020-07-28

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke ,  Joerg Jacobi

    IPC: H01J37/10 ,  H01J37/09 ,  H01J37/28

    Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.

    PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTICLE BEAMS
    3.
    发明申请
    PARTICLE BEAM SYSTEM FOR ADJUSTING THE CURRENT OF INDIVIDUAL PARTICLE BEAMS 有权

    公开(公告)号：US20210210303A1

    公开(公告)日：2021-07-08

    申请号：US17209626

    申请日：2021-03-23

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Dirk Zeidler ,  Hans Fritz ,  Ingo Mueller ,  Georgo Metalidis

    IPC: H01J37/12 ,  H01J37/153 ,  H01J37/244

    Abstract: A particle beam system includes: a particle source to generate a beam of charged particles; a first multi-lens array including a first multiplicity of individually adjustable and focusing particle lenses so that at least some of the particles pass through openings in the multi-lens array in the form of a plurality of individual particle beams; a second multi-aperture plate including a multiplicity of second openings downstream of the first multi-lens array so that some of the particles which pass the first multi-lens array impinge on the second multi-aperture plate and some of the particles which pass the first multi-lens array pass through the openings in the second multi-aperture plate; and a controller configured to supply an individually adjustable voltage to the particle lenses of the first multi-lens array and thus individually adjust the focusing of the associated particle lens for each individual particle beam.

    SYSTEM COMBINATION OF A PARTICLE BEAM SYSTEM AND A LIGHT-OPTICAL SYSTEM WITH COLLINEAR BEAM GUIDANCE, AND USE OF THE SYSTEM COMBINATION
    4.
    发明申请
    SYSTEM COMBINATION OF A PARTICLE BEAM SYSTEM AND A LIGHT-OPTICAL SYSTEM WITH COLLINEAR BEAM GUIDANCE, AND USE OF THE SYSTEM COMBINATION 有权

    公开(公告)号：US20210035773A1

    公开(公告)日：2021-02-04

    申请号：US16939706

    申请日：2020-07-27

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Dirk Zeidler ,  Michael Schall ,  Joerg Jacobi ,  Michel Le Maire

    IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147

    Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

    Charged particle beam system
    5.
    发明授权
    Charged particle beam system 有权

    公开(公告)号：US10811215B2

    公开(公告)日：2020-10-20

    申请号：US16416447

    申请日：2019-05-20

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

    IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

    Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

    METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM MICROSCOPE
    8.
    发明公开
    METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM MICROSCOPE 审中-公开

    公开(公告)号：US20230215686A1

    公开(公告)日：2023-07-06

    申请号：US18181395

    申请日：2023-03-09

    Applicant: Carl Zeiss MultiSEM GmbH

    Inventor： Dirk Zeidler ,  Gregor Dellemann ,  Gunther Scheunert

    IPC: H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2446 ,  H01J2237/24495 ,  H01J2237/24578

    Abstract: A method for operating a multi-beam particle beam microscope includes: scanning a multiplicity of particle beams over an object; directing electron beams emanating from impingement locations of the particle beams at the object onto an electron converter; detecting first signals generated by impinging electrons in the electron converter via a plurality of detection elements of a first detection system during a first time period; detecting second signals generated by impinging electrons in the electron converter via a plurality of detection elements of a second detection system during a second time period; and assigning to the impingement locations the signals which were detected via the detection elements of the first detection system during the first time period, for example on the basis of the detection signals which were detected via the detection elements of the second detection system during the second time period.

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