公开(公告)号：US20210217577A1

公开(公告)日：2021-07-15

申请号：US17215995

申请日：2021-03-29

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Christof Riedesel ,  Arne Thoma ,  Georgo Metalidis ,  Joerg Jacobi ,  Stefan Schubert ,  Ralf Lenke ,  Ulrich Bihr ,  Yanko Sarov ,  Georg Kurij

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/153 ,  H01J37/09 ,  H01J37/28

Abstract: A method of operating a multi-beam particle beam system includes: generating a multiplicity of particle beams such that they each pass through multipole elements that are either intact or defective; focusing the particle beams in a predetermined plane; determining excitations for the deflection elements of the multipole elements; exciting the deflection elements of the multipole elements that are intact with the determined excitations; modifying the determined excitations for the deflection elements of the multipole elements that are defective; and exciting the deflection elements of the defective multipole elements with the modified excitations. Modifying the determined excitations includes adding corrective excitations to the determined excitations. The corrective excitations are the same for all deflection elements of the defective multipole element.

公开(公告)号：US11087948B2

公开(公告)日：2021-08-10

申请号：US16940863

申请日：2020-07-28

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke ,  Joerg Jacobi

IPC: H01J37/10 ,  H01J37/09 ,  H01J37/28

Abstract: A multi-beam charged particle system includes: a vacuum enclosure having an opening covered by a door; a particle source configured to generate charged particles, wherein the particle source is arranged within the vacuum enclosure; at least one multi-aperture plate module including at least one multi-aperture plate and a base; and a transfer box having an opening covered by a door. The at least one multi-aperture plate includes a plurality of apertures. The base is configured to hold the at least one multi-aperture plate. The base is configured to be fixed relative to the vacuum enclosure such that the multi-aperture plate module is arranged in an interior of the vacuum enclosure such that, during operation of the particle beam system, particles traverse the plural multi-aperture plates through the apertures of the plates.

公开(公告)号：US20210035773A1

公开(公告)日：2021-02-04

申请号：US16939706

申请日：2020-07-27

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Michael Schall ,  Joerg Jacobi ,  Michel Le Maire

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/147

Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

公开(公告)号：US10811215B2

公开(公告)日：2020-10-20

申请号：US16416447

申请日：2019-05-20

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US11164715B2

公开(公告)日：2021-11-02

申请号：US17021724

申请日：2020-09-15

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US11087955B2

公开(公告)日：2021-08-10

申请号：US16939706

申请日：2020-07-27

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Michael Schall ,  Joerg Jacobi ,  Michel Le Maire

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

公开(公告)号：US20220277927A1

公开(公告)日：2022-09-01

申请号：US17663323

申请日：2022-05-13

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Stefan Schubert ,  Dieter Schumacher ,  Erik Essers ,  Ingo Mueller ,  Arne Thoma ,  Joerg Jacobi ,  Wilhelm Bolsinger ,  Dirk Zeidler

IPC: H01J37/28 ,  H01J37/317 ,  H01J37/147 ,  H01J37/04 ,  H01J37/244

Abstract: A particle beam system, such as a multi-beam particle microscope, includes a multi-beam deflection device and a beam stop. The multi-beam deflection device is arranged in the particle-optical beam path downstream of the multi-beam generator and upstream of the beam switch of the particle beam system. The multi-beam deflection device serves collectively blanks a multiplicity of charged individual particle beams. These impinge on a beam stop, which is arranged in the particle-optical beam path level with a site at which a particle beam diameter is reduced or is at a minimum. By way of example, such sites are the cross-over plane of the individual particle beams or an intermediate image plane. Associated methods for operating the particle beam system and associated computer program products are disclosed.

公开(公告)号：US20220102104A1

公开(公告)日：2022-03-31

申请号：US17546952

申请日：2021-12-09

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  András G. Major ,  Dirk Zeidler ,  Arne Thoma ,  Joerg Jacobi

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: A particle beam system includes a multi-beam particle source for generating a multiplicity of charged individual particle beams, and a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array includes a magnetically conductive multi-aperture plate having a multiplicity of openings, which is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the openings of the multi-aperture plate. The magnetic multi-deflector array also includes a magnetically conductive aperture plate having an individual opening. The aperture plate is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the first aperture plate. The multi-aperture plate and the first aperture plate are connected to each other such that a cavity is formed between the two plates. A first coil for generating a magnetic field is arranged in the cavity between the first aperture plate and the multi-aperture plate such that the multiplicity of individual particle beams substantially pass through the coil.

公开(公告)号：US11562881B2

公开(公告)日：2023-01-24

申请号：US17512825

申请日：2021-10-28

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.

公开(公告)号：US20220108864A1

公开(公告)日：2022-04-07

申请号：US17512825

申请日：2021-10-28

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Zeidler ,  Stefan Schubert ,  Ingo Mueller ,  Joerg Jacobi ,  Mario Muetzel ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/14 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/06

Abstract: A charged particle beam system includes a charged particle source that generates a first charged particle beam and a multi beam generator that generates a plurality of charged particle beamlets from an incoming first charged particle beam. Each individual beamlet is spatially separated from other beamlets. The charged particle beam system also includes an objective lens that focuses incoming charged particle beamlets in a first plane so that a first region in which a first individual beamlet impinges in the first plane is spatially separated from a second region in which a second individual beamlet impinges in the first plane. The charged particle beam system also includes a projection system and a detector system including a plurality of individual detectors. The projection system images interaction products leaving the first region within the first plane due to impinging charged particles onto a first detector and images interaction products leaving the second region in the first plane onto a second detector.