公开(公告)号：US20220392734A1

公开(公告)日：2022-12-08

申请号：US17820798

申请日：2022-08-18

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Yanko Sarov ,  Ulrich Bihr ,  Hans Fritz ,  Dirk Zeidler ,  Georg Kurij ,  Ralf Lenke ,  András G. Major ,  Christof Riedesel

IPC: H01J37/147 ,  H01J37/09

Abstract: Certain improvements of multi-beam raster units such as multi-beam generating units and multi-beam deflector units of a multi-beam charged particle microscopes are provided. The improvements include design, fabrication and adjustment of multi-beam raster units including apertures of specific shape and dimensions. The improvements can enable multi-beam generation and multi-beam deflection or stigmation with higher precision. The improvements can be relevant for routine applications of multi-beam charged particle microscopes, for example in semiconductor inspection and review, where high reliability and high reproducibility and low machine-to-machine deviations are desirable.

公开(公告)号：US20220415604A1

公开(公告)日：2022-12-29

申请号：US17898808

申请日：2022-08-30

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Dirk Preikszas ,  Hans Fritz ,  András G. Major

IPC: H01J37/141 ,  H01J37/21 ,  H01J37/153

Abstract: A particle beam system includes a multiple beam particle source to generate a multiplicity of charged individual particle beams, and a multi-pole lens sequence with first and second multi-pole lens arrays. The particle beam system also includes a controller to control the multi-pole lenses of the multi-pole lens sequence so related groups of multi-pole lenses of the multi-pole lens sequence through which the same individual particle beam passes in each case altogether exert an individually adjustable and focussing effect on the respective individual particle beam passing therethrough.

公开(公告)号：US20220102104A1

公开(公告)日：2022-03-31

申请号：US17546952

申请日：2021-12-09

Applicant: Carl Zeiss MultiSEM GmbH

Inventor： Hans Fritz ,  András G. Major ,  Dirk Zeidler ,  Arne Thoma ,  Joerg Jacobi

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: A particle beam system includes a multi-beam particle source for generating a multiplicity of charged individual particle beams, and a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array includes a magnetically conductive multi-aperture plate having a multiplicity of openings, which is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the openings of the multi-aperture plate. The magnetic multi-deflector array also includes a magnetically conductive aperture plate having an individual opening. The aperture plate is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the first aperture plate. The multi-aperture plate and the first aperture plate are connected to each other such that a cavity is formed between the two plates. A first coil for generating a magnetic field is arranged in the cavity between the first aperture plate and the multi-aperture plate such that the multiplicity of individual particle beams substantially pass through the coil.