Invention Application
- Patent Title: SEMICONDUCTOR WAFER EVALUATION APPARATUS AND SEMICONDUCTOR WAFER MANUFACTURING METHOD
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Application No.: US17519679Application Date: 2021-11-05
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Publication No.: US20220146564A1Publication Date: 2022-05-12
- Inventor: Koichi Murata , Isaho KAMATA , Hidekazu TSUCHIDA , Akira MIYASAKA
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Priority: JP2020-185713 20201106
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66 ; G01R1/067 ; G01R31/265 ; C23C16/32 ; C23C16/52 ; C30B25/16 ; C30B29/36

Abstract:
A semiconductor wafer evaluation apparatus brings a contact maker (mercury liquefied at room temperature), as a Schottky electrode, into contact with a semiconductor wafer, intermittently applies a voltage from a pulse power supply, and evaluates the state (kinds, density) of point defects by an evaluation means based on the status of the electrostatic capacity of the semiconductor wafer. In this manner, the state (kinds, density) of the point defects in the plane of a large-diameter semiconductor wafer is directly evaluated using a large table.
Public/Granted literature
- US11906569B2 Semiconductor wafer evaluation apparatus and semiconductor wafer manufacturing method Public/Granted day:2024-02-20
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